DOE OSTI · 1768736
Development of a high-k gate stack for atomic-precision advanced manufacturing.
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Lu, Tzu-Ming, Anderson, Evan Michael, Campbell, DeAnna Marie, Marshall, Michael Thomas, Lu, Ping, Schmucker, Scott William, Tracy, Lisa A, Robison, Mitchell, Arghavani, Reza, Maurer, Leon, Baczewski, Andrew David, Ward, Daniel, Misra, Shashank. 2020-02-01. Development of a high-k gate stack for atomic-precision advanced manufacturing.. https://www.osti.gov/biblio/1768736
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