DOE OSTI · 1831356
B- and Al- Doped Delta Layers in Si Using Halogen-Based Precursors.
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Baek, S., Farzani, A., Radue, M. S., Campbell, Quinn, Dwyer, K. J., Baczewski, Andrew David, Mo, Y., Misra, Shashank, Butera, R. E.. 2020-11-01. B- and Al- Doped Delta Layers in Si Using Halogen-Based Precursors.. https://doi.org/10.2172/1831356
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