DOE OSTI · 1840416
Atomic layer deposition of fluoride thin films
Abstract
A secondary electron emissive coating. The coating is formed by atomic layer deposition of CaF 2 on a substrate by ALD half cycle exposure of an alkaline metal amidinate and ALD half cycle exposure of a fluorinated compound, where the deposition occurs at a reaction temperature greater than a highest sublimation temperature of the first metal precursor and the second metal precursor and less than 50° C. above the highest sublimation temperature.
Keep this discovery
Explore connections, maps & timelines
Elam, Jeffrey W., Mane, Anil U., Gebhard, Sr., Michael John. 2021-09-07. Atomic layer deposition of fluoride thin films. https://www.osti.gov/biblio/1840416
Cite the original work for its findings. Save a collection to share your selection of sources.