DOE OSTI · 2005678
Integrating atomic layer doping (ALDo) with CMOS circuitry for reduced contact resistance.
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Anderson, Evan, Schmucker, Scott, Ivie, Jeffrey, Campbell, DeAnna, Lu, Tzu-Ming, Lu, Ping, Bussmann, Ezra, Leenheer, Andrew, Scrymgeour, David, Misra, Shashank. 2022-10-01. Integrating atomic layer doping (ALDo) with CMOS circuitry for reduced contact resistance.. https://doi.org/10.2172/2005678
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