Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

Bogroff, Malcolm [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:000900098688396X); Cowley, Gabriel [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)]; Nicastro, Ariel [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0009000424596539); Levy, David [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0009000632492849); Wu, Yueh-Chun [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)]; Mao, Nannan [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)] (ORCID:0000000335225341); Yang, Tilo H. [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)]; Zhang, Tianyi [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)]; Kong, Jing [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)]; Vasudevan, Rama [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000346928579); Kelley, Kyle P. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000276880484); Lawrie, Benjamin J. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:000000031431066X)

doi:10.1515/nanoph-2024-0724

DOE OSTI · 2526666

Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

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Abstract

Cathodoluminescence microscopy is now a wellestablished and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electronbeam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.

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2D materials 36 MATERIALS SCIENCE cathodoluminescence color centers

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Bogroff, Malcolm [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:000900098688396X), Cowley, Gabriel [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)], Nicastro, Ariel [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0009000424596539), Levy, David [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0009000632492849), Wu, Yueh-Chun [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)], Mao, Nannan [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)] (ORCID:0000000335225341), Yang, Tilo H. [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)], Zhang, Tianyi [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)], Kong, Jing [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)], Vasudevan, Rama [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000346928579), Kelley, Kyle P. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000276880484), Lawrie, Benjamin J. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:000000031431066X). 2025-03-06. Non-perturbative cathodoluminescence microscopy of beam-sensitive materials. https://doi.org/10.1515/nanoph-2024-0724

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