High-Intensity UV Exposure for the Rapid Screening of Silicon Photovoltaic Architectures

Rasmussen, Mirra M. [Case Western Reserve University, Cleveland, OH (United States)]; Sempertegui, Jose Diego Zubieta [Case Western Reserve University, Cleveland, OH (United States)]; Moser-Mancewicz, Nicholas [Arizona State University, Tempe, AZ (United States)]; Bryan, Jonathan L. [GAF Energy, San Jose, CA (United States)]; Hjerrild, Natasha E. [GAF Energy, San Jose, CA (United States)] (ORCID:0000000232035086); Davis, Kristopher O. [University of Central Florida, Orlando, FL (United States)] (ORCID:0000000257726254); Bertoni, Mariana I. [Arizona State University, Tempe, AZ (United States)] (ORCID:000000020415837X); Bruckman, Laura S. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000312711072); Martin, Ina T. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000194523299)

doi:10.1109/jphotov.2025.3611428

DOE OSTI · 3000480

High-Intensity UV Exposure for the Rapid Screening of Silicon Photovoltaic Architectures

Rasmussen, Mirra M. [Case Western Reserve University, Cleveland, OH (United States)]·Sempertegui, Jose Diego Zubieta [Case Western Reserve University, Cleveland, OH (United States)]·Moser-Mancewicz, Nicholas [Arizona State University, Tempe, AZ (United States)]·Bryan, Jonathan L. [GAF Energy, San Jose, CA (United States)]·Hjerrild, Natasha E. [GAF Energy, San Jose, CA (United States)] (ORCID:0000000232035086)·Davis, Kristopher O. [University of Central Florida, Orlando, FL (United States)] (ORCID:0000000257726254)·Bertoni, Mariana I. [Arizona State University, Tempe, AZ (United States)] (ORCID:000000020415837X)·Bruckman, Laura S. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000312711072)·Martin, Ina T. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000194523299)

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Abstract

Advanced Si photovoltaic architectures incorporate different materials and processing pathways that influence degradation modes. Ultraviolet-induced degradation (UVID) is an understudied degradation mode for advanced cell architectures and is of increasing concern to industry due to growing adoption of UV-transparent encapsulation and bifacial technologies. In order to adopt new and evolving technologies confidently, novel component materials and processing techniques must be evaluated and designed for long-term stability, in addition to the conventional design focus on efficiency. In this work, a study protocol framework is presented for the rapid screening of unencapsulated devices against UVID. Unencapsulated passivated emitter rear contact (PERC) and tunnel oxide passivated contact (TOPCon) devices were aged under different UV irradiance intensities and measured via conventional nondestructive electrical characterization methods to assess performance degradation. Based on the results, protocol efficacy and recommendations for further study are discussed. As a result, this work is part of a broader effort to develop rapid screening processes that cut across architectures and exposure conditions to aid module manufacturers in vetting new materials choices for long-term stability.

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Accelerated exposure UV degradation passivated emitter rear contact (PERC)study protocol tunnel oxide passivated contact (TOPCon)

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Rasmussen, Mirra M. [Case Western Reserve University, Cleveland, OH (United States)], Sempertegui, Jose Diego Zubieta [Case Western Reserve University, Cleveland, OH (United States)], Moser-Mancewicz, Nicholas [Arizona State University, Tempe, AZ (United States)], Bryan, Jonathan L. [GAF Energy, San Jose, CA (United States)], Hjerrild, Natasha E. [GAF Energy, San Jose, CA (United States)] (ORCID:0000000232035086), Davis, Kristopher O. [University of Central Florida, Orlando, FL (United States)] (ORCID:0000000257726254), Bertoni, Mariana I. [Arizona State University, Tempe, AZ (United States)] (ORCID:000000020415837X), Bruckman, Laura S. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000312711072), Martin, Ina T. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000194523299). 2025-10-22. High-Intensity UV Exposure for the Rapid Screening of Silicon Photovoltaic Architectures. https://doi.org/10.1109/jphotov.2025.3611428

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