Revertant mutation V48G alters conformational dynamics of highly drug resistant HIV protease PRS17
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Here, the linear and nonlinear benchmarks between the CLT code and the M3D-C1 code for the 2/1 resistive tearing mode and the 1/1 resistive kink mode are presented. CLT is an explicit finite difference code, while M3D-C1 is an implicit finite element code. Although the implementations of CLT and M3D-C1 are totally different, we find that the simulation results of the resistive-kink mode and the m/n=2/1 tearing mode from M3D-C1 and CLT are almost the same, including the linear and nonlinear growth rates, the mode structures, the nonlinear saturation levels, the Poincare plots, and the scaling laws. This confirms that the nonlinear results for the 1/1 resistive-kink mode and 2/1 tearing mode are accurate and reliable.
Organic semiconducting polymers are exciting materials for electronic applications because of their good mechanical and optoelectronic properties. A major advantage of organic semiconductors is their solution processability. This allows access to a variety of simple and cost-effective device fabrication methods compared to the expensive, high-temperature processing methods required for silicon-based electronics. However, these materials often have low solubility, which limits their processing to toxic halogenated solvents. Also, their limited solubility often leads to interfacial mixing during device fabrication. Herein, this work explores the incorporation of environmentally friendly carbohydrate side chains in conjugated polymers to enhance processability in eco-friendly solvents. Moreover, a mild postprocessing treatment was designed to enable solvent resistance. Isoindigo-based polymers with varied ratios of acetyl-protected galactose side chains were synthesized to improve solubility in o-anisole in the protected state, while inducing solvent resistance through intramolecular hydrogen bonding in the deprotected state. Solvent resistance was confirmed both visually upon submersion in various solvents and using UV–visible spectroscopy. Importantly, the mild basic treatment to achieve solvent resistance has no negative impact on the electronic performance of these materials in organic field-effect transistors, even after subsequent submersion in various solvents, making them a valuable platform for the production of green processable multilayer electronics.
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Antimicrobial resistance in urinary tract infections (UTIs) is a major public health concern. This study aims to characterize the phenotypic and genetic basis of multidrug resistance (MDR) among expanded-spectrum cephalosporin-resistant (ESCR) uropathogenic Escherichia coli (UPEC) causing UTIs in California patient populations. Between February and October 2019, 577 ESCR UPEC isolates were collected from patients at 6 clinical laboratory sites across California. Lineage and antibiotic resistance genes were determined by analysis of whole-genome sequence data. The lineages ST131, ST1193, ST648, and ST69 were predominant, representing 46%, 5.5%, 4.5%, and 4.5% of the collection, respectively. Overall, 527 (91%) isolates had an expanded-spectrum β-lactamase (ESBL) phenotype, with bla CTX-M-15 , bla CTX-M-27 , bla CTX-M-55 , and bla CTX-M-14 being the most prevalent ESBL genes. In the 50 non-ESBL phenotype isolates, 40 (62%) contained bla CMY-2 , which was the predominant plasmid-mediated AmpC (pAmpC) gene. Narrow-spectrum β-lactamases, bla TEM-1B and bla OXA-1 , were also found in 44.9% and 32.1% of isolates, respectively. Among ESCR UPEC isolates, isolates with an ESBL phenotype had a 1.7-times-greater likelihood of being MDR than non-ESBL phenotype isolates (P < 0.001). The cooccurrence of bla CTX-M-15 , bla OXA-1 , and aac(6')-Ib-cr within ESCR UPEC isolates was strongly correlated. Cooccurrence of bla CTX-M-15 , bla OXA-1 , and aac(6')-Ib-cr was associated with an increased risk of nonsusceptibility to piperacillin-tazobactam, cefepime, fluoroquinolones, and amikacin as well as MDR. Multivariate regression revealed the presence of bla CTX-M-55 , bla TEM-1B , and the ST131 genotype as predictors of MDR.
There is an urgent need for repair of hydropower components that have undergone damage due to cavitation. Conventional repair methods involve melting of materials and can deteriorate material properties and cause distortion. This study investigated the relevant properties of different materials using solid phase processing—cold spray technology. Stainless steel (SS) 316, Inconel 625 and CrC-NiCr materials were cold spray deposited onto base metal SS 316, respectively. Cold spray achieved dense uniform deposits with low level porosity, and intimate contact between the deposit and the base metal was observed. Severe plastic deformation imparted during the cold spray process resulted in significant grain size refinement, nanostructured regions were observed in the deposits across the interfacial area. Cold sprayed deposits exhibited elevated hardness in contrast to that of the base metal SS 316. The cavitation erosion resistance of the deposits was evaluated with a cavitation erosion jet adhering to ASTM G134. Both SS 316 and Inconel 625 achieved better cavitation erosion resistance when compared to that of the SS 316 base metal, with the former exhibiting close to a 4 times improvement.
The combined effects of anisotropic thermal transport and trapped energetic particles (EPs) on the stability of the resistive plasma resistive wall mode (RPRWM) are investigated by an energy-principle based analytical model. The results qualitatively confirm that of a recent toroidal modeling study [Bai et al., Phys. Plasmas 27, 072502 (2020)], in which the thermal transport can stabilize the RPPWM depending on the parameters of both the plasma equilibrium and energetic particles. The analytical model predicts a complete stabilization of the RPRWM in highly resistive plasmas, at sufficiently high EPs’ pressure, and finite plasma flow. The stabilizing effect of thermal transport originates from its enhancement of energy dissipations associated with both the resistive layer and the trapped energetic particles.
While commonly used in Si solar cell characterization, the Suns–Voc method of determining series resistance (Rs) is rarely used for CdTe and its alloys. However, it is advantageous relative to the slope method—commonly used in the CdTe community—because it measures series resistance at the maximum power point, at which a solar cell operates. Using the self-consistent predecessor to Suns–Voc, Jsc –Voc, , we determine Rs of two different CdSeTe/CdTe solar cell structures to be 0.96 and 2.72 Ωcm2, with repeated measurements showing little deviation
Extreme ultraviolet (EUV) lithography faces significant challenges in designing suitable resist materials that can provide adequate precision, while maintaining economically viable throughput. These challenges in resist materials have led to printing failures and high roughness in EUV patterns, compromising the performance of semiconductor devices. Integrating directed self-assembly (DSA) of block copolymers (BCPs) with EUV lithography offers a promising solution because, while the BCPs register to the EUV-defined chemical guiding pattern, the thermodynamically determined structures of the BCPs automatically rectify defects and roughness in the EUV pattern. Despite the superior resolution of metal-oxide EUV resists (MORs), their application to DSA is limited by the difficulty in converting them into chemical patterns that allow effective transfer of the rectified patterns of DSA films into inorganic materials. To address this challenge, this study introduces a novel strategy for fabricating chemical patterns using hydrogen silsesquioxane (HSQ), a high-resolution negative tone inorganic resist, as a model system for MORs. Initially, a sacrificial Cr pattern is generated from HSQ patterns via reactive ion etching. The sacrificial Cr pattern is converted into a chemical pattern by first grafting a water-soluble polyethylene oxide brush onto the substrate, then wet etching the Cr, and finally grafting nonpolar polystyrene brushes. Assembling polystyrene-block-poly(methyl methacrylate) on these patterns results in structures oriented and registered with the underlying pattern, achieving 24 nm full-pitch resolutions. In conclusion, this approach has the potential to integrate MOR patterns into the DSA process, thereby enabling the generation of high-quality sub-10 nm patterns with high-χ BCPs.
Edge states of a topological insulator can be used to explore fundamental science emerging at the interface of low dimensionality and topology. Achieving a robust conductance quantization, however, has proven challenging for helical edge states. In this work, we show wide resistance plateaus in kink states—a manifestation of the quantum valley Hall effect in Bernal bilayer graphene—quantized to the predicted value at zero magnetic field. The plateau resistance has a very weak temperature dependence up to 50 kelvin and is flat within a dc bias window of tens of millivolts. We demonstrate the electrical operation of a topology-controlled switch with an on/off ratio of 200. These results demonstrate the robustness and tunability of the kink states and its promise in constructing electron quantum optics devices.
While drug resistance mutations can often be attributed to the loss of direct or solvent-mediated protein−ligand interactions in the drug-mutant complex, in this study we show that a resistance mutation for the picomolar HIV-1 capsid (CA)-targeting antiviral (GS-6207) is mainly due to the free energy cost of the drug-induced protein side chain reorganization in the mutant protein. Among several mutations, M66I causes the most suppression of the GS-6207 antiviral activity (up to ~84,000-fold), and only 83- and 68-fold reductions for PF74 and ZW-1261, respectively. To understand the molecular basis of this drug resistance, we conducted molecular dynamics free energy simulations to study the structures, energetics, and conformational free energy landscapes involved in the inhibitors binding at the interface of two CA monomers. To minimize the protein−ligand steric clash, the I66 side chain in the M66I−GS-6207 complex switches to a higher free energy conformation from the one adopted in the apo M66I. In contrast, the binding of GS-6207 to the wild-type CA does not lead to any significant M66 conformational change. Based on an analysis that decomposes the absolute binding free energy into contributions from two receptor conformational states, it appears that it is the free energy cost of side chain reorganization rather than the reduced protein−ligand interaction that is largely responsible for the drug resistance against GS-6207.
The present disclosure provides methods for increasing drought resistance, salt resistance, and biomass production of a plant. The methods encompass expression of DiGeorge-Syndrome Critical Region 14 (DGCR14) gene in the plant. In comparison to a plant not manipulated in this manner, the disclosed, genetically-modified, plants display improved drought resistance and salt resistance. Also provided are plants that can be obtained by the method according to the invention, and nucleic acid vectors to be used in the described methods.
To identify, validate, and functionally characterize alleles that confer resistance to Septoria canker and leaf spot in Populus. The proposed research will elucidate a major mechanism of resistance to Sphaerulina musiva, the major limiting factor to plantations in eastern North America. Genome-wide association mapping, CRISPR/Cas9, and protein-protein assays will be used, enabling marker-aided breeding, reducing costs, and accelerating development of resistant varieties.
Abstract Aerosol jet printing (AJP) is an emerging direct write tool enabling rapid prototyping and fabrication of electronics components. AJP provides faster and less expensive production of devices with feature sizes of >10 microns compared to traditional MEMS processes. Herein, the fabrication of a resistance temperature detector‐micro hotplate (RTD‐µHP) is reported using AJP printed silver. AJP eliminates sophisticated MEMS processes such as masking, alignment, and etching. The compatibility of the AJP process with a broad range of materials is demonstrated by printing highly resolved lines on rigid and flexible substrates. Optimal thermal sintering conditions of AJP printed silver (Ag) lines are found by in situ resistance measurements. To stabilize the temperature coefficient of resistance (TCR) of the RTD‐µHP at high operating current levels, electrical sintering is performed on the RTD‐µHPs. Electrical sintering improves the conductivity of fully thermally sintered Ag RTD‐µHPs by 32% and provides a burn‐in mechanism for stabilizing the TCR. The TCR of the RTD‐µHPs after electrical sintering is 3.80 × 10 −3 at 22 °C, close to the value for bulk Ag. The performance of the RTD‐µHPs is tested using a reference thermocouple. The RTD‐µHPs show reliable and repeatable heating and temperature sensing up to 70 °C in air.
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Anomalous transport of multi-species plasma related to the resistive ballooning and resistive drift wave turbulence is considered in a “cold” ion approximation. It is found that similar to the resistive drift wave turbulence [see A. R. Knyazev and S. I. Krasheninnikov, Phys. Plasmas 31, 012502 (2024); and S. I. Krasheninnikov and R. D. Smirnov, Phys. Plasmas (to be published)] the addition of the ballooning drive does not change the main features of anomalous transport of the multi-species plasma: (i) The transport of all ion species is described as a transport of the passive scalars in the turbulent field of the electrostatic potential and electron density perturbation; (ii) the density of ion species with a larger ratio of the mass to charge has the tendency to the accumulation/depletion in the vortices of plasma flow; and (iii) the cross-field transport of all plasma species (including electrons and ions) is described by the same anomalous transport coefficient.
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