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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2023

Nanometer flat blazed x-ray gratings using ion beam figure correction

With the development of nanometer accuracy stitching interferometry, ion beam figuring (IBF) of x-ray mirrors can now be achieved with unprecedented performance. However, the process of producing x-ray diffraction gratings on these surfaces may degrade the figure quality due to process errors introduced during the ruling of the grating grooves. To address this challenge, we have investigated the post-production correction of gratings using IBF, where stitching interferometry is used to provide in-process feedback. A concern with ion beam correction in this case is that ions will induce enough surface mobility of atoms to cause smoothing of the grating structure and degradation of diffraction efficiency. In this study we found however that it is possible to achieve a nanometer-level planarity of the global grating surface with IBF, while preserving the grating structure. The preservation was so good, that we could not detect a change in the diffraction efficiency after ion beam correction. This is of major importance in achieving ultra-high spectral resolution, and the preservation of brightness for coherent x-ray beams.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Ion Beam Figuring System for Synchrotron X-Ray Mirrors Achieving Sub-0.2-µrad and Sub-0.5-nm Root Mean Square

Abstract Optics with high-precision height and slope are increasingly desired in numerous industrial fields. For instance, Kirkpatrick–Baez (KB) mirrors play an important role in synchrotron X-ray applications. A KB system is composed of two aspherical, grazing-incidence mirrors used to focus an X-ray beam. The fabrication of KB mirrors is challenging due to the aspherical departure of the mirror surfaces from base geometries and the high-quality requirements for slope and height residuals. In this paper, we present the process of manufacturing an elliptical cylinder KB mirror using our in-house-developed ion beam figuring (IBF) and metrology technologies. First, the key aspects of figuring and finishing processes with IBF are illustrated in detail. The effect of positioning error on the convergence of the residual slope error is highlighted and compensated. Finally, inspection and cross-validation using different metrology instruments are performed and used as the final validation of the mirror. Results confirm that relative to the requested off-axis ellipse, the mirror has achieved 0.15-µrad root mean square (RMS) and 0.36-nm RMS residual slope and height errors, respectively, while maintaining the initial 0.3-nm RMS microroughness.

36 MATERIALS SCIENCE↗
NASA NTRS1997

Ion Figuring of Replicated X-Ray Optics

This investigation included experiments to demonstrate ion beam figuring effects on electroless nickel with the expressed desire to figure X-ray optic mandrels. It was important to establish that ion beam figuring did not induce any adverse effects to the nickel surface. The ion beam has consistently been shown to be an excellent indicator of the quality of the subsurface. Polishing is not the only cause for failure in the ion beam final figuring process, the material composition is equally important. Only by careful consideration of both these factors can the ion beam final figuring process achieve its greatest potential. The secondary goal was to construct a model for representing the ion beam material removal rate. Representing the ion beam removal rate is only an approximation and has a number of limiting factors. The resolution of the metrology apparatus limits the modeling of the beam function as well. As the surface error corrections demand more precision in the final figuring, the model representing beam function must be equally precise. The precision to which the beam function can be represented is not only determined by the model but also by the measurements producing that model. The method developed for determining the beam function has broad application to any material destined to be ion beam figured.

Cantey, Thomas M.↗
DOE OSTI2023

Hybrid height and slope figuring method for grazing-incidence reflective optics

Grazing-incidence reflective optics are commonly used in synchrotron radiation and free-electron laser facilities to transport and focus the emitted X-ray beams. To preserve the imaging capability at the diffraction limit, the fabrication of these optics requires precise control of both the residual height and slope errors. However, all the surface figuring methods are height based, lacking the explicit control of surface slopes. Although our preliminary work demonstrated a one-dimensional (1D) slope-based figuring model, its 2D extension is not straightforward. In this study, a novel 2D slope-based figuring method is proposed, which employs an alternating objective optimization on the slopes in the x - and y -directions directly. An analytical simulation revealed that the slope-based method achieved smaller residual slope errors than the height-based method, while the height-based method achieved smaller residual height errors than the slope-based method. Therefore, a hybrid height and slope figuring method was proposed to further enable explicit control of both the height and slopes according to the final mirror specifications. An experiment to finish an elliptical-cylindrical mirror using the hybrid method with ion beam figuring was then performed. Both the residual height and slope errors converged below the specified threshold values, which verified the feasibility and effectiveness of the proposed ideas.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Computer-controlled finishing via dynamically constraint position-velocity-time scheduler

In a Computer Numerical Controlled (CNC) finishing process, the target material removal from an optical surface is guided by the convolution between the influence function of a machine tool and its dwell time at certain points over the surface. To reduce dynamics stressing and increase machining efficiency, the dwell time must be converted to varying velocities, which are the actual inputs to the machine tool controller. Conventionally, the conversion assumed constant acceleration and relied on linear motion interpolation, which caused discontinuities in velocities. This unsmooth motion affects the material removal distribution, and, thus, the accuracy of the finished surface shape. Many modern CNC machines support the smoother, cubic-polynomial interpolated Position-Velocity-Time (PVT) motion mode; however, the conventional scheduler may fail to provide suitable velocities for the PVT. Here in this study answers this challenge by proposing a novel PVT-based velocity scheduler that achieves smooth motion while considering CNC dynamic limits. Firstly, the principle of the PVT is explained, and the PVT-based velocity scheduler is formulated. Secondly, a quadratic programming is used to optimize the velocities by imposing the CNC dynamic constraints and the C 1 continuities (zeroth and first derivatives are continuous) simultaneously. Thirdly, the smoothness and accuracy of the scheduled velocities are studied on different kinds of tool paths via simulation. Finally, a sub-0.3 nm level surface finishing experiment using ion beam figuring is demonstrated to verify the feasibility of the proposed method. The PVT-based scheduler and simulator code is open-sourced.

36 MATERIALS SCIENCE↗
DOE OSTI2026

Optimized manufacturing process for multilayer two-dimensional focusing mirrors in laboratory X-ray applications

Recent advances in laboratory X-ray applications require high-performance optical components that achieve exceptional imaging resolution and beam uniformity within compact experimental setups. Montel mirrors have become a preferred solution due to their unique dual-reflection focusing mechanism and a space-efficient design. Here, in this study, we present an effective manufacturing process for producing Montel mirrors tailored to focus laboratory X-ray beams. The mirrors were fabricated from single-crystal silicon substrates, chosen for their high mechanical stability and compatibility with precision polishing techniques. Our approach begins with the integration of a deterministic chemo-mechanical polishing (CMP)-based pre-shaping step followed by ion beam figuring (IBF), significantly improving manufacturing efficiency. Subsequently, our custom-developed advanced metrology and IBF techniques were employed for fabricating an off-axis, elliptical cylinder Montel mirror system with a 6-mrad total slope, with stringent optical specifications. While post-IBF processes, including multilayer coating, dicing, and gluing, introduced minor surface errors, yet their impact on performance remained negligible. The Montel mirrors manufactured with the optimized process exhibited significantly improved beam uniformity and a reduced focal spot size. These findings validate our approach as a viable solution for high-precision Montel mirror fabrication and facilitate further advancements in laboratory X-ray applications.

36 MATERIALS SCIENCE↗
DOE OSTI2024

E-PVT: enhanced position-velocity-time scheduler for computer-controlled optical finishing with comprehensive considerations of dynamics constraints, continuity and efficiency

Deterministic computer-controlled optical finishing is an essential approach for achieving high-quality optical surfaces. Its determinism and convergence rely heavily on precise and smooth motion control to guide the machine tool over an optical surface to correct residual errors. One widely supported and smooth motion control model is position-velocity-time (PVT), which employs piecewise cubic polynomials to describe positions. Our prior research introduced a PVT-based velocity scheduling method, demonstrating sub-nanometer level convergence in ion beam figuring (IBF) processes. However, three challenges remained. Firstly, this method relies on quadratic programming, resulting in computational intensiveness for dense tool paths. Secondly, the dynamics constraints and velocity and acceleration continuities are not comprehensively considered, limiting the full potential of PVT-based control. Thirdly, no compensation mechanism existed when dynamics constraints are exceeded. In this study, in response to these challenges, we proposed the Enhanced PVT (E-PVT) method, reducing the time complexity from O ( n 3 ) to O ( n ) while fully addressing dynamics constraints and continuities. A novel compensation method utilizing particle swarm optimization was proposed to address situations where dynamics constraints might be exceeded while maintaining the overall processing efficiency. Validation through simulation and experimentation confirmed the improved performance of E-PVT.

36 MATERIALS SCIENCE↗
NASA NTRS2017

Keck Segment Surface Artifacts: Impacts on Segment Phasing and Image Quality

We show that the segments of the Keck telescopes su er from small but signi cant surface artifacts that limit segment phasing accuracy. Both the segment surface artifacts themselves and the limits they place on segment phasing have important implications for adaptive optics, high contrast imaging, and seeing limited observations. These surface artifacts are likely by-products of the segment polishing, most likely the Ion Beam Figuring (IBF) process that constitutes the nal step of the segment surface guring. The surface artifacts di ract a signi cant amount of light out past 3.5 arcseconds and generate chromatic e ects that limit segment phasing accuracy. We present on-sky measurements of the di racted intensity. Segment surface roughness measurements are also presented, which show that surface roughness is not the source of the problem. These results have direct relevance to segment manufacturing for the Thirty Meter Telescope (TMT) and other segmented mirror telescopes.

Brock, Neal↗
NASA NTRS2018

Interferometric Characterization of Keck Segment Edge Errors

The Keck telescope segments were manufactured by stressed mirror polishing of large circular pieces of Zerodur that were then cut into hexagons and finished by Ion Beam Figuring (IBF). It has long been believed that this process results in segments with little or no edge effects. As a result, this same general approach is planned for segment manufacturing for the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT). However, recent measurements at the Keck telescope suggest that at least some of the Keck segments have significant aberrations within 60 mm of the edge. These aberrations impact the telescope phasing and the overall telescope image quality. We present interferometric measurements of multiple Keck segments, characterizing the surface errors near the edges over spatial periods from 5 cm down to 1 mm. We show that the largest phasing and image quality effects are due to plateaus of unremoved material, left behind after IBF as a result of obscuration by the IBF supports. Apart from these plateaus, the edge quality is relatively good, though not as good as in the segment interiors. Some residual phasing and image quality effects remain, and these are not currently understood.

Martinek, Stephen J.↗
NASA NTRS1996

Investigation of ion-beam machining methods for replicated x-ray optics

The final figuring step in the fabrication of an optical component involves imparting a specified contour onto the surface. This can be expensive and time consuming step. The recent development of ion beam figuring provides a method for performing the figuring process with advantages over standard mechanical methods. Ion figuring has proven effective in figuring large optical components. The process of ion beam figuring removes material by transferring kinetic energy from impinging neutral particles. The process utilizes a Kaufman type ion source, where a plasma is generated in a discharge chamber by controlled electric potentials. Charged grids extract and accelerate ions from the chamber. The accelerated ions form a directional beam. A neutralizer outside the accelerator grids supplies electrons to the positive ion beam. It is necessary to neutralize the beam to prevent charging workpieces and to avoid bending the beam with extraneous electro-magnetic fields. When the directed beam strikes the workpiece, material sputters in a predicable manner. The amount and distribution of material sputtered is a function of the energy of the beam, material of the component, distance from the workpiece, and angle of incidence of the beam. The figuring method described here assumes a constant beam removal, so that the process can be represented by a convolution operation. A fixed beam energy maintains a constant sputtering rate. This temporally and spatially stable beam is held perpendicular to the workpiece at a fixed distance. For non-constant removal, corrections would be required to model the process as a convolution operation. Specific figures (contours) are achieved by rastering the beam over the workpiece at varying velocities. A unique deconvolution is performed, using series-derivative solution developed for the system, to determine these velocities.

Drueding, Thomas W.↗
NASA NTRS2005

Making AlN(x) Tunnel Barriers Using a Low-Energy Nitrogen-Ion Beam

A technique based on accelerating positive nitrogen ions onto an aluminum layer has been demonstrated to be effective in forming thin (<2 nm thick) layers of aluminum nitride (AlN(x)) for use as tunnel barriers in Nb/Al-AlN(x)/Nb superconductor/insulator/ superconductor (SIS) Josephson junctions. AlN(x) is the present material of choice for tunnel barriers because, to a degree greater than that of any other suitable material, it offers the required combination of low leakage current at high current density and greater thermal stability. While ultra-thin AlN films with good thickness and stoichiometry control are easily formed using techniques such as reactive molecular beam epitaxy and chemical vapor deposition, growth temperatures of 900 C are necessary for the dissociative adsorption of nitrogen from either nitrogen (N2) or ammonia (NH3). These growth temperatures are prohibitively high for the formation of tunnel barriers on Nb films because interfacial reactions at temperatures as low as 200 to 300 C degrade device properties. Heretofore, deposition by reactive sputtering and nitridation of thin Al layers with DC and RF nitrogen plasmas have been successfully used to form AlN barriers in SIS junctions. However, precise control over critical current density Jc has proven to be a challenge, as is attaining adequate process reproducibility from system to system. The present ion-beam technique is an alternative to the plasma or reactive sputtering techniques as it provides a highly controlled arrival of reactive species, independent of the electrical conditions of the substrate or vacuum chamber. Independent and accurate control of parameters such as ion energy, flux, species, and direction promises more precise control of film characteristics such as stoichiometry and thickness than is the case with typical plasma processes. In particular, the background pressure during ion-beam nitride growth is 2 or 3 orders of magnitude lower, minimizing the formation of compounds with contaminants, which is critical in devices the performance of which is dictated by interfacial characteristics. In addition, the flux of incoming species can be measured in situ using ion probes so that the dose can be controlled accurately. The apparatus used in the present ion-beam technique includes a vacuum chamber containing a commercial collimated- ion-beam source, a supply of nitrogen and argon, and an ion probe for measuring the ion dose. Either argon or nitrogen can be used as the feed gases for the ion source, depending on whether cleaning of the substrate or growth of the nitride, respectively, is desired. Once the Nb base electrode and Al proximity layer have been deposited, the N2 gas line to the ion beam is vented and purged, and the ion-source is turned on until a stable discharge is obtained. The substrate is moved over the ion-beam source to expose the Al surface layer to the ion beam (see figure) for a specified duration for the formation of the nitride tunnel barrier. Next, the Nb counter-electrode layer is deposited on the nitride surface layer. The Nb/Al- AlN(x)/Nb-trilayer-covered substrate is then patterned into individual devices by use of conventional integrated-circuit processing techniques.

Kaul, Anupama↗
NASA NTRS2019

Highly Absorptive Pupil Mask Fabricated with Black Silicon

Many of NASA’s direct imaging of exoplanet missions and projects require fabricated coronagraph masks to control scattering and diffraction of light. The designed, patterned mask intended for the coronagraphic testbeds are highly absorptive in the visible range on non-metallic regions. In this work, we employed the cryogenic etching process to fabricate black silicon (BSi) to achieve a high aspect ratio (HAR) structures with higher etch rate than conventional reactive ion etching (REI). Recent bidirectional reflectance distribution function (BRDF) measurements of uniformly etched BSi on silicon wafer show highly diffusive BSi with a specular reflective component in the orders of seven magnitudes lower than the total hemispherical reflectance when the polarized or non-polarized incident beam is used.

black-silicon↗
NASA NTRS1994

Neutral ion sources in precision manufacturing

Ion figuring of optical components is a relatively new technology that can alleviate some of the problems associated with traditional contact polishing. Because the technique is non contacting, edge distortions and rib structure print through do not occur. This initial investigation was aimed at determining the effect of ion figuring on surface roughness of previously polished or ductile ground ceramic optical samples. This is the first step in research directed toward the combination of a pre-finishing process (ductile grinding or polishing) with ion figuring to produce finished ceramic mirrors. The second phase of the project is focusing on the development of mathematical algorithms that will deconvolve the ion beam profile from the surface figure errors so that these errors can be successfully removed from the optical components. In the initial phase of the project, multiple, chemical vapor deposited silicon carbide (CVD SiC) samples were polished or ductile ground to specular or near-specular roughness. These samples were then characterized to determine topographic surface information. The surface evaluation consisted of stylus profilometry, interferometry, and optical and scanning electron microscopy. The surfaces, were ion machined to depths from 0-5 microns. The finished surfaces were characterized to evaluate the effects of the ion machining process with respect to the previous processing methods and the pre-existing subsurface damage. The development of the control algorithms for figuring optical components has been completed. These algorithms have been validated with simulations and future experiments have been planned to verify the methods. This paper will present the results of the initial surface finish experiments and the control algorithms simulations.

Fawcett, Steven C.↗
NASA NTRS2005

Miniature Focusing Time-of-Flight Mass Spectrometer

An improved miniature time-of-flight mass spectrometer has been developed in a continuing effort to minimize the sizes, weights, power demands, and costs of mass spectrometers for such diverse applications as measurement of concentrations of pollutants in the atmosphere, detecting poisonous gases in mines, and analyzing exhaust gases of automobiles. Advantageous characteristics of this mass spectrometer include the following: It is simple and rugged. Relative to prior mass spectrometers, it is inexpensive to build. There is no need for precise alignment of its components. Its mass range is practically unlimited Relative to prior mass spectrometers, it offers high sensitivity (ability to measure relative concentrations as small as parts per billion). Its resolution is one dalton (one atomic mass unit). An entire mass spectrum is recorded in a single pulse. (In a conventional mass spectrometer, a spectrum is recorded mass by mass.) The data-acquisition process takes only seconds. It is a lightweight, low-power, portable instrument. Although time-of-flight mass spectrometers (TOF-MSs) have been miniaturized previously, their performances have not been completely satisfactory. An inherent adverse effect of miniaturization of a TOF-MS is a loss of resolution caused by reduction of the length of its flight tube. In the present improved TOF-MS, the adverse effect of shortening the flight tube is counteracted by (1) using charged-particle optics to constrain ion trajectories to the flight-tube axis while (2) reducing ion velocities to increase ion flight times. In the present improved TOF-MS, a stream of gas is generated by use of a hypodermic needle. The stream of gas is crossed by an energy-selected, pulsed beam of electrons (see Figure 1). The ions generated by impingement of the electrons on the gas atoms are then focused by three cylindrical electrostatic lenses, which constitute a segmented flight tube. After traveling along the flight tube, the ions enter a charged-particle detector. The output of the detector is fed to a counting circuit to obtain data on the counting rate as a function of time. Inasmuch as time of flight is directly proportional to the ion mass, a plot of the counting rate versus time of flight is equivalent to a mass spectrum (see Figure 2).

Kanik, Isik↗
DOE OSTI2026

Toward Automated Plasma Focus Ion Beam Instrument Calibration for Materials Processing [Poster]

To accelerate the transition to autonomous focused ion beam (FIB) microscopy, we require an objective figure of merit (FOM) for assessing calibration. For our purposes, these FOMs related to beam astigmatism, quad, and focus. Intelligent calibration integrated into scripted workflows will enable fully automated sample preparation workflows that produce higher quality samples with less operator time.

97 MATHEMATICS AND COMPUTING↗
NASA NTRS2004

Ion Milling of Sapphire

The ion milling of sapphire is a complicated operation due to several characteristics of the material itself. It is a relatively hard transparent nonconductive crystalline material that does not transfer heat nearly as well as metals that have been successfully ion milled in the past. This investigation involved designing an experimental arrangement, using existing ion milling equipment, as the precursor to figuring the surface of sapphire and other insulating optical materials. The experimental arrangement employs a laser probe beam to constantly monitor the stresses being induced in the material, as it is being ion milled. The goal is to determine if the technique proposed would indeed indicate the stress being induced in the material so that these stresses can be managed to prevent failure of the optic.

Gregory, Don A.↗