NASA NTRS · 19820050551
Diagnostic study of BSF silicon solar cells
Abstract
Solar cells equipped with back surface fields (BSF) were fabricated by means of an aluminum alloy, boron diffusion, and boron ion implantation. The importance of initial thickness, resistivity, orientation, and the crystal growth method were examined. Aluminum in paste form was screen printed on the cell, followed by alloy formation at 800 C for a minute. Application of the BSFs resulted in open circuit voltage improvements dependent on the substrate resistivity, ranging from 10 mV at 0.3 ohm-cm to 50 mV at 15 ohm-cm. The gains in performance were attributed to a longer penetration depth, a heightened concentration profile at the interface, and higher concentrations in the p+ layer.
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Yoo, H., Iles, P., Ho, F., Pollock, G., Koliwad, K.. 1981-01-01. Diagnostic study of BSF silicon solar cells. https://ntrs.nasa.gov/citations/19820050551
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