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DOE OSTI · 1813319

Dopant Diffusion Control for Improved Tandem Cells Grown by D-HVPE

Roberts, Dennice M.·Simon, John·Schulte, Kevin L.·Young, Matthew·Ptak, Aaron J.
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Abstract

GaInP top cell current-density presently limits the performance of HVPE-grown two-junction devices, in large part due to unwanted dopant diffusion. Here, we institute mitigation strategies to lower the diffusion of dopants from both the front contact and back surface field. Successful application of these strategies resulted in a short-circuit current density of 12.1 mA/cm 2 in a GaInP/GaAs cell, an improvement of 0.9 mA/cm2 over our previous best cell. The reduced Se diffusion results in a thinner unpassivated emitter, which can lead to higher series resistance. Despite the increased resistance we obtained an efficiency increase from 23.7% to 24.8%.

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Roberts, Dennice M., Simon, John, Schulte, Kevin L., Young, Matthew, Ptak, Aaron J.. 2021-07-27. Dopant Diffusion Control for Improved Tandem Cells Grown by D-HVPE. https://doi.org/10.1109/jphotov.2021.3095756

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