Atomic and molecular layer deposition for surface modification

Vähä-Nissi, Mika; Sievänen, Jenni; Salo, Erkki; Heikkilä, Pirjo; Kenttä, Eija; Johansson, Leena-Sisko; Koskinen, Jorma T.; Harlin, Ali

doi:10.1016/j.jssc.2013.11.040

DOE OSTI · 22334237

Atomic and molecular layer deposition for surface modification

Vähä-Nissi, Mika·Sievänen, Jenni·Salo, Erkki·Heikkilä, Pirjo·Kenttä, Eija·Johansson, Leena-Sisko·Koskinen, Jorma T.·Harlin, Ali

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Abstract

Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas–solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin – even non-uniform – atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid. - Graphical abstract: Print quality of a polylactide film surface modified with atomic layer deposition prior to inkjet printing (360 dpi) with an aqueous ink. Number of printed dots illustrated as a function of 0, 5, 15 and 25 deposition cycles of trimethylaluminum and water. - Highlights: • ALD/MLD can be used to adjust surface characteristics of films and fiber materials. • Hydrophobicity after few deposition cycles of Al{sub 2}O{sub 3} due to e.g. complex formation. • Same effect on cellulosic fabrics observed with low temperature deposited TiO{sub 2}. • Different film growth and oxidation potential with different precursors. • Hybrid layer on inorganic layer can be used to improve adhesion of polymer melt.

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37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY ADHESION ALUMINIUM OXIDES DEPOSITION DEPOSITS EXTRUSION HYBRIDIZATION LACTIC ACID LAYERS MOLECULES OXIDATION POLYMERS POROUS MATERIALS SUBSTRATES THIN FILMS TITANIUM OXIDES

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Vähä-Nissi, Mika, Sievänen, Jenni, Salo, Erkki, Heikkilä, Pirjo, Kenttä, Eija, Johansson, Leena-Sisko, Koskinen, Jorma T., Harlin, Ali. 2014-06-01. Atomic and molecular layer deposition for surface modification. https://doi.org/10.1016/j.jssc.2013.11.040

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