DOE OSTI · 2423716
Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange
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Lenef, Julia D., Gayle, Andrew J., Jo, Jaesung, Fuelling, Kalyn M., Yadavalli, Srinivas K., Ortiz-Ortiz, Alondra M., Sun, Kai, Peterson, Rebecca L., Dasgupta, Neil P.. 2023-03-17. Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange. https://doi.org/10.1021/acs.chemmater.2c03773
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