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DOE OSTI · 1841279

Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Miao, Yurun·Lee, Dennis T.·de Mello, Matheus Dorneles·Ahmad, Mueed·Abdel-Rahman, Mohammed K.·Eckhert, Patrick M.·Boscoboinik, J. Anibal·Fairbrother, D. Howard·Tsapatsis, Michael
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Abstract

Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

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Miao, Yurun, Lee, Dennis T., de Mello, Matheus Dorneles, Ahmad, Mueed, Abdel-Rahman, Mohammed K., Eckhert, Patrick M., Boscoboinik, J. Anibal, Fairbrother, D. Howard, Tsapatsis, Michael. 2022-01-20. Solvent-free bottom-up patterning of zeolitic imidazolate frameworks. https://doi.org/10.1038/s41467-022-28050-z

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