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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 109 records · Page 6
All sourcesNASA NTRSDOE OSTI
NASA NTRS1977

Diffraction grating transmission efficiencies for XUV and soft X rays

The manufacture and properties of a grating intended for extrasolar X-ray studies are described. The manufacturing process uses a split laser beam exposing an interference pattern on the photoresist-coated glass plated with a nickel parting layer. The grating, supporting structure, and mounting frame are electrodeposited on the nickel parting layer, and the final product is lifted from the glass substrate by selective etching of the nickel. A model was derived which relates the number of counts received in a given order m as a function of photon wavenumber. A 4-deg beam line was used to measure the efficiencies of gold transmission gratings for diffraction of X-rays in the range of 45 to 275 eV. The experimental results are in good agreement with model calculations.

Schnopper, H. W.↗
NASA NTRS1977

Infrared image construction with computer-generated reflection holograms

Computer-generated reflection holograms hold substantial promise as a means of carrying out complex machining, marking, scribing, welding, soldering, heat treating, and similar processing operations simultaneously and without moving the work piece or laser beam. In the study described, a photographically reduced transparency of a 64 x 64 element Lohmann hologram was used to make a mask which, in turn, was used (with conventional photoresist techniques) to produce a holographic reflector. Images from a commercial CO2 laser (150W TEM(00)) and the holographic reflector are illustrated and discussed.

Angus, J. C.↗
NASA NTRS1978

Comprehensive analysis of gratings for ultraviolet space instrumentation

Comprehensive measurements in the vacuum UV range of 1200-3000 A of efficiency, polarization, and scattering of classically ruled and photoresist gratings are reported. The results show that the art of ruling gratings for vacuum UV use has reached a high level of sophistication and that careful analysis of grating properties can lead to useful improvement of the ruling art.

Mount, G. H.↗
NASA NTRS1979

Quality control during IC processing

Manual gives detailed test procedures for controlling silicon-wafer processing in manufacture of integrated circuits. Included among 43 test procedures are: ionic, bacterial, and solids contamination of high-purity water needed for wafer processing; crystallographic reflection, purity, and orientation; substrate dimensions and finish; thickness of deposited epitaxial films; oxide quality; photoresist characteristics; pinholes in insulating layers; metallized adhesion; and quality of ohmic contact.

Source record↗
NASA NTRS1980

Multilayer metalization of MOS IC's

Modified ion-bombardment technqiue interconnects MOS circuit elements without affecting circuit parameters. Multilevel metalization involves: surface treatment prior to metalization; first metalization; metal pattern definition and photoresist removal; dielectric deposition; second metalization; and final dielectric deposition.

Bouldin, D. L.↗
NASA NTRS1978

Development of Low Cost Contacts to Silicon Solar Cells

Commercial electroless Cu solutions were used. Satisfactory adhesion (and fairly good cell performance) resulted from the use of thin layers of barrier metals such as Au, Cr or Pd. In these tests, photoresist masks were used to contact silicon P-type slices with diffused N+ and alloyed P+ surfaces; and electrolytic Cu solution was used to build up the contact thickness to provide good cell behavior. In addition some cells with evaporated Cr-Cu contacts were also made (along with evaporated Ti-Pd-Ag contacts as controls), with the intention of subjecting cells to gradually increasing heat-treatments, to determine whether Cu causes the cells to be inherently unstable.

Iles, P. A.↗
NASA NTRS1978

The Array Automated Assembly Task for the Low Cost Solar Array Project, Phase 2

During the program a process sequence was proposed and tested for the fabrication of dendritic welb silicon into solar modules. This sequence was analyzed as to yield and cost and these data suggest that the price goals of 1986 are attainable. Specifically, it was shown that a low cost POCL3 is a suitable replacement for the semiconductor grade, and that a suitable CVD oxide can be deposited from a silane/air mixture using a Silox reactor. A dip coating method was developed for depositing an antireflection coating from a metalorganic precursor. Application of photoresist to define contact grids was made cost effective through use of a dip coating technique. Electroplating of both Ag and Cu was shown feasible and cost effective for producing the conductive metal grids on the solar cells. Laser scribing was used to separate the cells from the dendrites without degradation. Ultrasonic welding methods were shown to be feasible for interconnecting the cells. A study of suitable low cost materials for encapsulation suggest that soda lime glass and phenolic filled board are preferred.

Campbell, R. B.↗
NASA NTRS1977

Design, fabrication, and evaluation of charge-coupled devices with aluminum-anodized-aluminum gates

A 4-phase, 49 1/2 bit CCD shift register was designed and fabricated using two levels of aluminum metallization with anodic Al2O3 insulation separating the layers. Test circuitry was also designed and constructed. A numerical analysis of an MOS-RC transmission line was made and results are given to characterize performance for various conductivities. The electrical design of the CCD included a low-noise dual-gate input and a balanced floating diffusion output circuit. Metallization was accomplished both by low voltage DC sputtering and thermal evaporation. The audization was according to published procedures using a buffered tartaric acid bath. Approximately 20 wafers were processed with 50 complete chips per wafer. All devices failed by shorting between the metal levels at some point. Experimental procedures eliminated temperature effects from sintering and drying, anodic oxide thickness, edge effects, photoresist stripping procedures, and metallization techniques as the primary causes of failure. It was believed from a study of SEM images that protuberances (hillocks) grow up from the first level metal through the oxide either causing a direct short or producing a weak, highly stressed insulation point which fails at low voltage. The cause of these hillocks is unknown; however, they have been observed to grow during temperature excursions to 470 C.

Gassaway, J. D.↗
NASA NTRS1978

An investigation for the development of an integrated optical data preprocessor

The successful fabrication and demonstration of an integrated optical circuit designed to perform a parallel processing operation by utilizing holographic subtraction to simultaneously compare N analog signal voltages with N predetermined reference voltages is summarized. The device alleviates transmission, storage and processing loads of satellite data systems by performing, at the sensor site, some preprocessing of data taken by remote sensors. Major accomplishments in the fabrication of integrated optics components include: (1) fabrication of the first LiNbO3 waveguide geodesic lens; (2) development of techniques for polishing TIR mirrors on LiNbO3 waveguides; (3) fabrication of high efficiency metal-over-photoresist gratings for waveguide beam splitters; (4) demonstration of high S/N holographic subtraction using waveguide holograms; and (5) development of alignment techniques for fabrication of integrated optics circuits. Important developments made in integrated optics are the discovery and suggested use of holographic self-subtraction in LiNbO3, development of a mathematical description of the operating modes of the preprocessor, and the development of theories for diffraction efficiency and beam quality of two dimensional beam defined gratings.

Verber, C. M.↗
NASA NTRS1980

Nonlinear optical processing with Fabry-Perot interferometers containing phase recording media

New techniques in nonlinear optical processing are explored, based on the operation of intensity level selection as performed by a Fabry-Perot interferometer containing a phase object. The image being processed is recorded on a medium between the mirrors as a spatially varying phase shift less than pi. The interferometer only transmits light through those portions of the object that corresponds to a single value of the phase and hence to a single intensity level in the input. More complicated operations such as thresholding and analog-to-digital conversion are performed by modulating the light source as the different levels are selected. Photoresist and lithium niobate have been used as phase objects, and experimental data for both are presented. Three kinds of Fabry-Perot interferometers have been used to demonstrate nonlinear processing using coherent and incoherent light. Color images have been produced with black and white inputs and white light illumination.

Bartholomew, B. J.↗
NASA NTRS1979

Semiconductor technology program. Progress briefs

The current status of NBS work on measurement technology for semiconductor materials, process control, and devices is reported. Results of both in-house and contract research are covered. Highlighted activities include modeling of diffusion processes, analysis of model spreading resistance data, and studies of resonance ionization spectroscopy, resistivity-dopant density relationships in p-type silicon, deep level measurements, photoresist sensitometry, random fault measurements, power MOSFET thermal characteristics, power transistor switching characteristics, and gross leak testing. New and selected on-going projects are described. Compilations of recent publications and publications in press are included.

Bullis, W. M.↗
NASA NTRS1980

Solar cells and modules from dentritic web silicon

Some of the noteworthy features of the processes developed in the fabrication of solar cell modules are the handling of long lengths of web, the use of cost effective dip coating of photoresist and antireflection coatings, selective electroplating of the grid pattern and ultrasonic bonding of the cell interconnect. Data on the cells is obtained by means of dark I-V analysis and deep level transient spectroscopy. A histogram of over 100 dentritic web solar cells fabricated in a number of runs using different web crystals shows an average efficiency of over 13%, with some efficiencies running above 15%. Lower cell efficiency is generally associated with low minority carrier time due to recombination centers sometimes present in the bulk silicon. A cost analysis of the process sequence using a 25 MW production line indicates a selling price of $0.75/peak watt in 1986. It is concluded that the efficiency of dentritic web cells approaches that of float zone silicon cells, reduced somewhat by the lower bulk lifetime of the former.

Campbell, R. B.↗
NASA NTRS1981

A Module Experimental Process System Development Unit (MEPSDU)

Design work for a photovoltaic module, fabricated using single crystal silicon dendritic web sheet material, resulted in the identification of surface treatment to the module glass superstrate which improved module efficiencies. A final solar module environmental test, a simulated hailstone impact test, was conducted on full size module superstrates to verify that the module's tempered glass superstrate can withstand specified hailstone impacts near the corners and edges of the module. Process sequence design work on the metallization process selective, liquid dopant investigation, dry processing, and antireflective/photoresist application technique tasks, and optimum thickness for Ti/Pd are discussed. A noncontact cleaning method for raw web cleaning was identified and antireflective and photoresist coatings for the dendritic webs were selected. The design of a cell string conveyor, an interconnect feed system, rolling ultrasonic spot bonding heat, and the identification of the optimal commercially available programmable control system are also discussed. An economic analysis to assess cost goals of the process sequence is also given.

Source record↗
NASA NTRS1982

Self-heated thermocouples for far-infrared detection

A novel self-heated Bi-Sb thermocouple for far-infrared detection has been developed. The detector is suitable for integration with monolithic antennas and imaging arrays. The device is fabricated in a single photolithography masking step using a photoresist-bridge technique. This bridge technique has also been used to make microbolometers with lower 1/f noise than those made by two conventional masking steps. The thermocouples have a noise equivalent power of 7 x 10 to the -10th W/sq rt of Hz and a 3-dB frequency response of 150 kHz.

Neikirk, D. P.↗
NASA NTRS1984

Ti/Pd/Cu Contacts for Semiconductor Devices

Copper systems equivalent in performance to silver or gold systems. Titanium layer and palladium layer deposited on semiconductor device by electron beam evaporation. Desired pattern etched using photoresist. Thin layer of copper plated on contact pattern from cyanide solution. Copper layer then built up to 4 to 8 microns by electroplatng from acid solution.

Campbell, R. B.↗
NASA NTRS1983

Non-noble metal based metallization systems

The results of efforts to produce a nonsilver metallization system for silicon photovoltaic cells are given. The system uses a metallization system based on molybdenum, tin, and titanium hydride. The initial work in this system was done using the MIDFILM process. The MIDFILM process attains a line resolution comparable to photoresist methods with a process related to screen printing. The surface to be processed is first coated with a thin layer of photopolymer material. Upon exposure to ultraviolet light through a suitable mask, the polymer in the non-pattern area crosslinks and becomes hard. The unexposed pattern areas remain tacky. The conductor material is then applied in the form of a dry mixture of metal which adheres to the tacky pattern area. The assemblage is then fired to ash the photopolymer and sinter the conductor powder.

Garcia, A., III↗
NASA NTRS1985

Analyzing Microchips With Dark-Field Negative Photomicrography

Inverse development process yields fine details. Photomicrographic technique produces images of integrated-circuit chips. Technique based on dark-field illumination: (chip lit with bright central spot of light and photographed by light scattered or diffracted from spot. Reveals more about microstructure patterns related to photoresist masking than more conventional bright-field method.

Suszko, S. F.↗
NASA NTRS1985

Thin-film Sensors for Space Propulsion Technology

SSME components such as the turbine blades of the high pressure fuel turbopump are subjected to rapid and extreme thermal transients that contribute to blade cracking and subsequent failure. The objective was to develop thin film sensors for SSME components. The technology established for aircraft gas turbine engines was adopted to the materials and environment encountered in the SSME. Specific goals are to expand the existing thin film sensor technology, to continue developing improved sensor processing techniques, and to test the durability of aircraft gas turbine engine technology in the SSME environment. A thin film sensor laboratory is being installed in a refurbished clean room, and new sputtering and photoresist exposure equipment is being acquired. Existing thin film thermocouple technology in an SSME environment are being tested. Various coatings and their insulating films are being investigated for use in sensor development.

Kim, W. S.↗