NASA NTRS · 19740000126
Fabrication of thick structures by sputtering
Abstract
Deposit, 5500-gram of Cu-0.15 wt % Zr alloy, sputtered onto copper cylinder to average thickness of 12.29 mm. Structure was achieved with high-rate sputter deposition for about 100 hours total sputtering time. Material had twice the strength of unsputtered material at temperatures to 723 K and equivalent strength at nearly 873 K.
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Kazaroff, J. M., Mcclanahan, E. D., Busch, R., Moss, R. W.. 1974-12-01. Fabrication of thick structures by sputtering. https://ntrs.nasa.gov/citations/19740000126
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